| PART |
Description |
Maker |
| CMF20120D |
Silicon Carbide Power MOSFET
|
Cree, Inc
|
| C3M0065090D |
Silicon Carbide Power MOSFET
|
Cree, Inc
|
| C2M0080120D-15 |
Silicon Carbide Power MOSFET
|
Cree, Inc
|
| C3M0065100K |
Silicon Carbide Power MOSFET C3M Planar MOSFET Technology N-Channel Enhancement Mode
|
Wolfspeed
|
| SCT3030ALGC11 |
N-channel Silicon Carbide Power MOSFET
|
ROHM
|
| SCT3030KL SCT3030KLC11 |
N-channel Silicon Carbide Power MOSFET
|
ROHM
|
| C2M0045170D |
Silicon Carbide Power MOSFET C2MTM MOSFET Technology
|
Cree, Inc
|
| SHB636053E |
HIGH VOLTAGE SILICON CARBIDE SINGLE PHASE FULL WAVE BRIDGE 5 A, SILICON CARBIDE, BRIDGE RECTIFIER DIODE
|
Sensitron Semiconductor
|
| STPSC406 STPSC406B-TR STPSC406D |
4 A, 600 V, SILICON CARBIDE, RECTIFIER DIODE
600 V power Schottky silicon carbide diode
|
STMicroelectronics
|
| W4NRD0X-0000 W4NRD8C-U000 W4NXD8C-0000 W4NXD8C-L00 |
Diameter: 50.8mm; LCW substrates; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 50.8mm; ultra-low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 50.8mm; standatd mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 50.8mm; low mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 50.8mm; select mircopipe density; silicon carbide substrates. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 76.2mm; LCW type; 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 50.8mm; LCW type; 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
Diameter: 50.8mm; lsemi-insulating (prototype); 6H-silicon carbide. For high frequency power devices, high power devices, high temperature devices, optoelectronic devices, III-V nitride deposition
|
CREE POWER
|
| 92005A120 C2M0080120D 74270011 CRD8FF1217P-1 |
CREE Silicon Carbide MOSFET Evaluation Kit
CREE Silicon Carbide MOSFET Evaluation Kit
|
Cree, Inc
|
| GB10SLT12-252 GB10SLT12-252-18 |
Silicon Carbide Power Schottky Diode
|
GeneSiC Semiconductor, ...
|
|
